Advantest will initially target the E3660 for deployment at Merchant Mask Shops, where commercial mask manufacturers produce masks for external customers, and Captive Mask Shops, ...

CD-SEM, the workhorse metrology tool used by fabs for process control, is facing big challenges at 5nm and below. Traditionally, CD-SEM imaging has relied on a limited number of image frames for ...

Advantest (TSE:6857) recently introduced the next-generation CD-SEM E3660, which is designed to meet the stringent requirements of semiconductor manufacturing. This release is aligned with ongoing ...

SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of ...

Photomasks are becoming more complex at each node. In fact, masks are moving from traditional shapes to non-orthogonal patterns and complex shapes, such as curvilinear mask patterns. To measure ...

A persistent problem in scanning electron microscopy is the deposition of hydrocarbon contamination induced by an electron beam. Generally, the deposition of contamination on a specimen is a negative ...