High-NA EUV extends resolution by increasing optical numerical aperture, but at the cost of dramatically more complex and expensive optical systems. The industry is therefore confronting a dual ...

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Nearly 30 years ago, optical lithography was supposed to hit the wall at the magical 1 micron barrier, prompting the need for a new patterning technology such as direct-write electron beam and X-ray ...

While 3D devices and technology such as through-silicon vias (TSVs) definitely complicate matters in the design, verification and manufacturing space, one might assume there would also be an impact on ...

Computational lithography uses various techniques of resolution enhancement technology (RET) to create more perfect images on the chip as the elements of the transistor get smaller and smaller. THIS ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10-nm ...